Used HUGLE UPC-12100 #293759044 for sale

HUGLE UPC-12100
ID: 293759044
Wafer Size: 12"
Vintage: 2008
Foup cleaner system, 12" 2008 vintage.
HUGLE UPC-12100 Wafer & Mask Scrubber is a powerful cleaning device designed specifically for use in semiconductor process applications. It uses a combination of advanced technologies to quickly and efficiently remove contaminants such as particles, grease, oxide, and other wafer, mask, or glassware debris from wafer and mask surfaces. The parts can be cleaned one-by-one with no need for additional handling. UPC-12100 is built with a stainless steel body, which resists corrosion and prevents melting. It can handle pieces up to 800 mm (31.5 inches) in diameter. The scrubber is equipped with an adjustable scrub angle to ensure the best cleaning result. The gasket is a special rubber that ensures tight contact between the wafer and mask surfaces. This prevents leakage and allows for efficient cleaning. The scrubber is powered by a motor or air pressure. It can reach speeds of up to 2400 rpm, depending on the size of the wafer. It is also equipped with a rotating brush mechanism that gently moves the wafer along its surface. This gently removes the contaminants without damaging the surface. Besides its scrubbing functions, HUGLE UPC-12100 has additional capabilities. It is designed with a defluxing function that works with both high and low amounts of chemicals. This allows the scrubber to perform its cleaning operations efficiently and with minimal waste. It is also equipped with a centering axis for positioning and orienting the wafer and mask precisely. The scrubber has a large capacity waste tank, allowing it to collect large volumes of pollutants. The filter bag collects the contaminants to ensure the cleanliness of the scrubbed surfaces. UPC-12100 also features an air recovery system that recycles the scrubbed air and reuses it to adjust the conditions inside the scrubber. HUGLE UPC-12100 is a reliable and energy-efficient solution for cleanroom semiconductor applications. Its high performance, durability, and efficiency make it an ideal choice for leading fabrication and scientific facilities.
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