Used HUGLE UPC-8300 #9157621 for sale

HUGLE UPC-8300
ID: 9157621
Wafer Size: 8"
POD Cleaner, 8".
HUGLE UPC-8300 is a wafer and mask scrubber used in the production of integrated circuits and semiconductor devices. This scrubber is designed to remove dust particles from the surface of wafers and masks prior to lithography and etching. UPC-8300 is equipped with a three-stage scrubber equipment. The first stage consists of a wafer scrubbing station to ensure the wafer is free from all dust particles. This station is equipped with pressurized jets of deionized water and a rotating scrubbing brush that simultaneously cleans the wafer surface. The second stage of the scrubber includes an air shower that further removes any remaining dust particles. The third stage of the scrubber is fitted with a manually-controlled brush and pneumatic blowgun to provide a final cleaning of the surface. The scrubber also features a self-contained recycling system. This unit recirculates dirty water to remove contaminants and reduce the need for water-filled baths. The recycled solution is heated to ensure it contains zero particles or bacteria. The scrubber also includes an adjustable temperature sensor to monitor water temperature and ensure wafers are scrubbed at an optimal rate. HUGLE UPC-8300 is constructed with two stainless steel frames and is IP-41 rated for superior protection. It is equipped with an LCD display for monitoring scrubbing progress and features a modular design with several customizable options. The scrubber comes with two control modes, manual and automatic, that allow users to easily switch between different functions. The machine also includes a self-diagnosis machine and several safety mechanisms to alert users of any potential problems. UPC-8300 is an ideal choice for wafer and mask cleaning processes. Its robust construction and advanced features make it suitable for use in harsh production environments. This scrubber comes with an easy-to-use interface and provides accurate, reliable cleaning results every time.
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