Used IMO ECO-2000 #293828352 for sale

IMO ECO-2000
Manufacturer
IMO
Model
ECO-2000
ID: 293828352
Cleaning system Upper spray plane Cleaning: 1 hour Drying: 1 hour Running noise: 55 DB (A) Cleaning time: 5-40 min Rinse temperature: 20-70°C Cleaning temperature: 20-70°C Cycle length and rinse cycle: 2-20 min Hot air drying temperature: 50-100°C Water consumption per filling: 5 L (Di-water) Board size: 413 x 205 mm, 413 x 240 mm Interior dimensions W x D x H 53 x 48 x 52 cm Board size T x H: 460 x 510 mm PCB Dimension: 340 x 260 mm Power consumption: 2,4 Kw Power supply: 230 V, 50-60 Hz.
IMO ECO-2000 is a cutting-edge wafer and mask scrubber designed for precision cleaning and surface preparation in semiconductor manufacturing processes. This state-of-the-art equipment is equipped with advanced features and technologies to ensure efficient and uniform cleaning of wafers and masks, critical components used in the fabrication of microelectronics. At the core of ECO-2000 scrubber is its high-performance cleaning chamber, which is specifically designed to accommodate wafers and masks of various sizes. The chamber is constructed from corrosion-resistant materials to ensure durability and long-term reliability in demanding semiconductor production environments. The chamber features multiple ports for loading and unloading wafers and masks, as well as integrated spray nozzles and a recirculation equipment for efficient distribution of cleaning solutions. One of the key features of IMO ECO-2000 scrubber is its customizable cleaning process, which allows users to adjust critical parameters such as cleaning solution flow rate, temperature, pressure, and duration according to specific cleaning requirements. This flexibility enables users to achieve optimal cleaning results for a wide range of wafer and mask materials, including silicon, gallium arsenide, and glass substrates. ECO-2000 scrubber is equipped with a sophisticated control system that offers intuitive operation and real-time monitoring of the cleaning process. The unit features a user-friendly interface with a touchscreen display, which allows operators to easily input cleaning parameters, monitor cleaning progress, and diagnose potential issues. Additionally, the control machine can store multiple cleaning recipes, enabling users to quickly switch between different cleaning processes without the need for manual adjustments. In terms of cleaning performance, IMO ECO-2000 scrubber utilizes a combination of chemical and mechanical cleaning methods to remove contaminants such as photoresist residues, particles, and organic materials from wafers and masks. The equipment is compatible with a variety of cleaning solutions, including acids, solvents, and detergents, to address different types of contaminants and substrate materials. The scrubber incorporates advanced fluid dynamics and turbulent flow technology to ensure uniform distribution of cleaning solutions and thorough removal of contaminants across the entire surface of wafers and masks. Furthermore, ECO-2000 scrubber is designed with a focus on environmental sustainability and cost efficiency. The equipment features a closed-loop tool for reclamation and recycling of cleaning solutions, minimizing waste generation and reducing chemical consumption. Additionally, the scrubber is equipped with energy-saving features such as temperature control and standby modes to optimize energy efficiency and reduce operational costs. Overall, IMO ECO-2000 wafer and mask scrubber represents a state-of-the-art solution for semiconductor manufacturers looking to achieve high-quality cleaning results, improved process performance, and cost-effective operation. With its advanced features, customizable cleaning process, and environmental sustainability benefits, ECO-2000 scrubber is a versatile and reliable tool for enhancing wafer and mask cleaning processes in the semiconductor industry.
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