Used K&S 971 #9195855 for sale

K&S 971 wafer & mask scrubber is a compact, lightweight, and powerful multi-purpose scrubber used in wafer and photoresist mask cleaning. It is designed for both wet and dry chemical scrubbing of single or multiple masks, including aluminum, quartz, and glass. 971 scrubber is a reliable piece of equipment for wafer cleaning and the removal of photoresist, organic residue, oxides, and other surface contamination in the process of photolithography. K&S 971 wafer & mask scrubber has two modes available; Normal Scrub mode and Deep Scrub mode. In Normal Scrub mode, the scrub head oscillates side to side while a gentle scrubbing force is applied to the wafer surface, allowing for a reliable and consistent cleaning action. For more persistent material, the Deep Scrub mode applies a range of aggressive scrubbing motion to rapidly remove the residue without causing damage to the surface. 971 is compatible with a variety of bath solutions. The adjustable bath allows for custom cleaning solutions that can target different materials with the right concentration of chemicals. Furthermore, the separate scrubbing chamber prevents contaminants from entering the bath as well as avoiding any chemical interaction with the wafer during scrubbing. K&S 971 offers a range of operating parameters for a more tailored scrubbing performance, such as scrubber speed, depth of oscillation and overall scrubber cycle time. In addition, 971 has a built-in diagnostic system that monitors scrubber performance and tracks maintenance cycles. The system provides diagnostic feedback to help improve scrubber performance. K&S 971 wafer and mask scrubber is the most efficient and reliable scrubber for the wafer and photolithography process. Its flexibility and diagnostic feature set it as the preferred choice in the semiconductor industry, enabling production of high-quality wafer and photolithography products.