Used KARL SUSS / MICROTEC MJB-45S #9194567 for sale

KARL SUSS / MICROTEC MJB-45S is a wafer and mask scrubber used in semiconductor manufacturing. This equipment is designed to automate the processes of wafer and mask cleaning. MICROTEC MJB-45S is equipped with a robotic arm for loading and unloading, along with four stations for processing. This system has a multi-stage cleaning operation for improved results. First, a robot removes the wafer or mask from the cassette and places it in the wet station. At the wet station, the wafer or mask is sprayed with a heated cleaning solution to remove any particles and debris that might be on the surface. Then, the robot transports the wafer or mask to the rinse station, where it is rinsed with DI water to remove any remaining residue. In the scrubber station, the wafer or mask is scrubbed gently with a soft brush to further ensure that any particles have been removed. For wafers, the robot then transports the wafer to the dryer station where it is dried. Once the wafer or mask has been cleaned, it is placed back in the cassette and readied for the next step in the manufacturing process. KARL SUSS MJB-45S offers great precision, accuracy and repeatability in a wide variety of scrubbing processes. It also has a consistent, controllable cleaning cycle and is capable of reliably producing high-quality, particle-free results. It also has a low water consumption rate, meaning operators don't need to frequently replace or replenish cleaning solutions. Further, it is designed to be used in a closed loop process, meaning that the same cleaning solution can be used multiple times and therefore reducing waste. Not only is MJB-45S reliable and efficient, but it is also incredibly safe. The unit is designed with safety in mind and is equipped with sensors and protection devices that dramatically reduce the risk of injury. The machine is also designed to be ergonomic, making it easy to use for operators. Overall, KARL SUSS / MICROTEC MJB-45S is an effective and efficient scrubbing tool for wafers and masks. It offers a consistent, reliable process and is designed with safety and ergonomics in mind. Highly precise and repeatable results can be achieved with minimal cleaning solution waste, making it a great choice for semiconductor manufacturing operations that require particle-free results.