Used LAM RESEARCH / ONTRAK DSS 200 Series 0 #9224100 for sale

LAM RESEARCH / ONTRAK DSS 200 Series 0 is an advanced wafer and mask scrubber designed for use in semiconductor manufacturing environments. The scrubber's design allows for superior performance across a wide range of materials, from standard photomasks to highly complex photomasks with integrated circuits (ICs). The scrubber is capable of efficiently cleaning nearly all types of masks, including both mask and wafer types. The scrubber utilizes a combination of high-pressure air and an oscillating disc brush to quickly and effectively remove photomask residues and particle contamination from photomask surfaces. The scrubber first uses an air nozzle to apply a pressurized spray of water, soap, or cleaning solution onto the surface of the photomask. This is followed by a rotating brush which agitates the solution and removes the residues and particle contamination from the photomask. The scrubber is designed to minimize damage to the photomasks and ensure that all mask and wafer surfaces are thoroughly cleaned. The scrubber also includes a built-in safety system, which prevents the scrubber from running when the photomask is in an unprotected state. This allows users to safely clean photomasks without having to fear damaging sensitive surfaces. Additionally, an optional biosafety filter is available for use with this scrubber, which helps to keep airborne debris from entering operator's lungs or contaminating the surrounding environment. The scrubber has high throughput capabilities and is capable of a capacity of up to 200 wafers per hour. This allows for quick and efficient cleaning while also maintaining a high level of cleanliness. The scrubber is powered by a triple-redundant power supply with overload, over-voltage, and short circuit protection, which helps to ensure dependable operation. In conclusion, ONTRAK DSS 200 Series 0 is an advanced wafer and mask scrubber designed to provide superior cleaning performance for semiconductor manufacturing environments. The scrubber combines efficient cleaning capabilities with a built-in safety system and high throughput capacity to ensure reliable and safe cleaning of photomasks.