Used LAM RESEARCH / ONTRAK Series II #9412623 for sale

LAM RESEARCH / ONTRAK Series II Wafer and Mask Scrubber is an advanced, automated system designed to clean and de-contaminate large scale lithography masks and wafers. This scrubber utilizes state-of-the-art robotics and advanced image recognition technology to analyze and process different mask and wafer characteristics, including: surface topography, patterned features, and structured features. The process begins with the scrubber scanning special optical elements on top of the wafer or mask to detect imperfections. Once detected, the device then uses an automated "brushing" process to apply a high-pressure stream of a cleaning solution to the surface of the wafer or mask. The scrubber then uses its image recognition technology to detect any residual contaminants, and repeat the cleaning process until a contamination-free result is achieved. ONTRAK Series II Wafer and Mask Scrubber offers superior performance compared other professional-grade scrubbers due to its advanced robotic and image recognition technologies. The scrubber also provides professionals with convenience as it is designed with a small and portable form factor, making it easier to transport and use in different locations. The scrubber is equipped with an intuitive graphical user interface, making operations easy to understand and setup. Additionally, the scrubber is capable of storing up to 8 user-programmable cleaning methods for different lithography processes, enabling users to switch between different recipes seamlessly. The device's advanced networking capabilities also allow users to monitor operation in multiple locations. LAM RESEARCH Series II Wafer and Mask Scrubber is a must-have tool for professional lithographers and semiconductor manufacturers. Its robust imaging recognition capabilities, and automated cleaning process, enable the scrubber to effectively clean and de-contaminate masks and wafers with minimal effort and time. Additionally, the device's small form factor and easy-to-use interface make operation quick and efficient, while its network capabilities, and stored cleaning programs, allow users to access and manage operations remotely. If you're looking for an advanced and effective scrubber for large scale lithography processes, Series II Wafer and Mask Scrubber is the perfect choice.