Used LAM RESEARCH / ONTRAK Synergy #293587490 for sale

LAM RESEARCH / ONTRAK Synergy is a wafer and mask scrubber designed for particle removal from the surface of semiconductor wafers and photomasks used to create integrated circuit outlines. The equipment integrates two proven scrubbing technologies, ONTRAK scrubber and LAM RESEARCH Robotic Wafer Scrubber, to offer unparalleled scrubbing performance with a single platform. LAM RESEARCH / ONTRAK scrubber utilizes a high-speeds spinning brush, that is perfect for removing stubborn particles and small defects on the surface of the wafer or photomask. The brush is powered via a rotating slurry solution that is sprayed onto the surface and flows away with the debris. The particles and debris are efficiently engulfed and lifted off the surface with the slurry. This technology is most effective for removing smaller particles and residue that are difficult to remove with dry wafer or mask scrubbing systems. ONTRAK wafer scrubber is a robotics-controlled system that provides a controlled, uniform scrubbing force and motion. This type of unit is necessary for removing contaminants from large panel scrubbing applications, and is also ideal for batch scrubbing of production wafers. It uses brushless motors that generate an oscillatory motion of the brushes for wafer and photomask front side scrubbing, controlled by a robotic scrubbing arm. The brushing motion is designed to effectively sweep the surface in a consistent and efficient manner, resulting in less time spent scrubbing and improved particle elimination. The combination of these two technologies in ONTRAK Synergy machine is effective in scrubbing the surfaces of both wafers and photomasks with minimal displacement of them or the features of the surface, while also providing maximum particle surface removal. It is especially suitable for applications where high particle counts, critical features, or high line densities need to be maintained. This advanced scrubbing tool is ideal for those working in semiconductor wafer and photomask fabrication.