Used LAM RESEARCH / ONTRAK Synergy #293606441 for sale

LAM RESEARCH / ONTRAK Synergy is a wafer and mask scrubber, a device used to process delicate semiconductor wafers. It was specifically developed and designed to clean the surface of wafers and masks for use in semiconductor manufacturing equipment, such as lithography systems. The scrubber is designed to remove surface contamination from wafers and masks, removing particles that can cause defects and yield loss when used as a part of the photolithography process. The scrubber is made up of two main components, the scrubber and scrubber chamber. The scrubber is a non-destructive device, while the scrubber chamber has a cleaning chamber as well as a chlorination chamber. The scrubber is composed of two counter-rotating scrub discs, a set of vibration dampeners and exhaust fan for drying wafers and masks that are being processed. The scrub discs are designed to remove particles from the surface of the wafers, while the vibration dampeners reduce risks of chipping or cracking the sensitive material during the scrubbing process. The scrubber chamber is composed of a main process chamber, a rinse chamber, and a mask cleaning chamber. The main process chamber is designed to clean and polish the wafer surface, and is equipped with an exhaust system that evacuates effluent from the scrubbing process. The rinse chamber is designed for final cleansing and rinsing of the wafers, allowing for reliable and consistent cleaning performance. Lastly, the mask cleaning chamber is used to clean masks with a pressureless process, providing better cleaning results with less risk of damage to masks. In addition, the scrubber has features that allow for the easy collection and recycling of waste water generated during the scrubbing process. It is also equipped with an advanced vacuum system that uses a powerhead filter to remove particles from the wafer surfaces before drying. Furthermore, the scrubber's design is such that it is capable of operating without the need for a tool change, improving throughput and reducing downtime. The scrubber can support a wide range of wafer sizes and utilizes a proven scrubber disc design for optimal contamination removal from the wafer surfaces. Overall, ONTRAK Synergy wafer and mask scrubber provides a reliable, cost-effective solution for semiconductor processing applications. Its advanced design and features provide improved cleaning performance for wafers and masks, as well as improved safety for users. In addition, its ability to easily collect and recycle waste water and its efficient filter system provide reliable protection from sub-repair contamination and yield loss, making it an effective solution for semiconductor fabs.