Used MAT 1207BWA #9153452 for sale

MAT 1207BWA is a wafer and mask scrubber designed to provide oxidation protection and cleanliness of photomasks. This scrubber can thoroughly and securely remove any remaining residue from masks after they have completed their full process of etching or cleaning. It is enabled with various features that offer superior cleaning performance such as a top-loading wafer and mask scrubbing platform, a powerful multi-stage cleaning process, and an integrated subambient temperature control equipment. The scrubber utilizes a high powered, multi-stage cleaning process that utilizes a mix of solvent and detergent solutions as well as mechanical action to thoroughly cleanse the surface of the wafer and mask. This process removes various contaminants such as dust, debris, particles, residual photoresist, and monomers left on the surface of the wafer or mask after the etching or cleaning process is complete. As the scrubber platform moves, brushes spin to allow the detergent solution to scrub the surface of the wafer and mask. The scrubbing process is highly efficient and powerful to remove even the most stubborn of residue. 1207BWA scrubber is equipped with a sub-ambient temperature control system that offers precise control over the temperature throughout the molecular cleaning process. This temperature control helps maintain the integrity of the surface while also providing an optimal environment to allow the detergent solution to provide a deep and effective clean. This temperature controls also prevents the formation of condensation, - which can result in chemical contamination - by keeping the surface of the wafer and mask cool. In order to ensure the highest level of wafer and mask cleanliness, the scrubber comes with a built-in air-purification unit as well. This purification machine is capable of removing dust particles, debris, and other residual photoresist and debris from the air in order to prevent recontamination of the wafer and mask during the scrubbing process. MAT 1207BWA wafer and mask scrubber offers superior cleanliness and oxidation protection for all photomasks. It utilizes a combination of a powerful scrubbing process and a precise temperature control tool to ensure optimal surface cleanliness, while its air-purification asset eliminates dust, debris, and any remaining photoresist or debris that could lead to further contamination. With its advanced features, this scrubber is a reliable and efficient solution for any photomask cleaning process.