Used NEW TECH WAVE 3600 HC #9409605 for sale

NEW TECH WAVE 3600 HC is a state-of-the-art scrubber equipment from NEW TECH WAVE Inc. It is designed for thorough and consistent cleaning of Resist, Etch, Ion Mapper Photoresist and Mask scrubbing applications. 3600 HC is designed to remove surface contaminants and residues which may affect the performance of semiconductor products. The system uses chemical, mechanical and ultrasonic energy to ensure a deep-cleaning process in a single pass. The number of scrubbing operations can be programmed and adjusted depending on the type of application. The scrubber features a two-tank unit with a chemical-resistant stainless-steel tank, which contains a special scrubbing solution. This solution is designed to remove chemical and particles present on the surface of the wafers and masks. To provide maximum efficiency the scrubbing solution can be regulated with a simple solution-level control machine. The tool also includes an automated tracking asset, which monitors the growth of contaminants present on the wafer or mask surface. This allows the scrubber to optimize its cleaning cycle as the surface contamination level changes. NEW TECH WAVE 3600 HC includes a self-cleaning stirrer to dissipate chemical residues ensuring a better dissolution of the chemical for a complete cleaning. The scrubbing speed is adjustable allowing for complete control on the scrubbing time and pressure avoiding any possible damage to the wafer or mask. 3600 HC includes a built-in touch panel with an intuitive GUI. This allows user to easily set up and program the parameters of the scrubbing cycle, including the type of material being cleaned, cleaning pressure, solution temperature, rinse frequency and cycle duration. Also the touch panel provides detailed cleaning results and can be used to monitor the cleaning cycle in real-time. In summary, NEW TECH WAVE 3600 HC is a reliable and efficient scrubber model. Its automated tracking equipment and self-cleaning features make it an ideal choice for deep-cleaning applications. Furthermore, the touch panel allows easy programming and monitoring, making the system an effective and user-friendly solution for wafer and mask scrubbing.