Used NIKON NRW-504 #9137286 for sale

NIKON NRW-504 Wafer & Mask Scrubber is designed to clean wafers and masks before and/or after processing. This machine was designed to use a combination of gas and physical scrubbing action to remove particles and contaminants from the wafers and masks. The gas scrubbing action uses a controlling equipment that is enclosed in a stainless steel shell and is connected to the scrubber housing. This system injects a regulated flow of purified gas at a specific rate and at a controlled temperature into the scrubber chamber. The gas scrubbing action removes particles, dust, and other contaminants that have become lodged on the wafer or mask surface. The physical scrubbing action uses a mechanical brush assembly driven by a stepper motor that is located in the lower section of the scrubber housing. This brush assembly, consisting of a variety of cleaning brushes, will rotate on its own axis and scrub the wafer or mask surface to remove unwanted particles. The rotation rate can be adjusted as necessary to ensure that the appropriate and consistent level of scrubbing action is applied to the wafer or mask surface. The wafer and mask slides and linear transfer components are constructed from stainless steel with hard/smooth bearing surfaces. This ensures that all controlled motion provides a smooth and consistent environmental operating unit. The optional linear transfer machine has been designed to provide extra protection during transfer from station to station. The gas and physical scrubbing actions combined together provide consistent and reliable cleaning performance. The scrubber and its components are designed to be user friendly and can be operated simply with minimal instruction and training. NRW-504 Wafer & Mask Scrubber provides a safe and efficient method for cleaning wafers and masks. The scrubber housing is constructed with single-wall steel and meets Class 10000 requirements for cleanroom operation. The controlling tool, robot-controlled motion, and data tracking capabilities combine to provide reliable and repeatable performance in meeting the highest standards of cleanliness.