Used NIKON NRW-504UV #9111289 for sale

NIKON NRW-504UV Wafer & Mask Scrubber is an automated wafer and mask scrubbing device used in the semiconductor industry. It is designed to reduce the amount of labor and risk associated with manual cleaning processes. NRW-504UV has a reliable and robust self-cleaning mechanism that is effective in removing contamination from the surface of wafers and masks. It automatically detects, collects and stores the contaminants and removes them with high efficiency. The device can monitor the cleaning process and is capable of actively responding to changes in wafer or mask surface properties. It also features advanced control systems that allow for precise control of the scrubbing process. NIKON NRW-504UV is equipped with a powerful UV source, allowing for dead and dormant particles present on the surface of the wafer or mask to be readily detectable by the device. It is equipped with a vapor-hose system for removing debris and contaminants without damage to the wafer or mask. The device is also capable of removing surface particles that have become embedded in the wafer or mask. NRW-504UV offers excellent wetting and cleaning performance, ensuring that contaminants are removed quickly and thoroughly. The device can operate in different environments, including normal laboratory, vacuum and ultra-cleanroom conditions. The device is highly reliable, with a low operational failure rate, and has easy-to-access maintenance and calibration points. NIKON NRW-504UV is designed to enable safe and efficient wafer and mask scrubbing, with minimal risk of damage. The device is designed to cater to the needs of the semiconductor industry, and is perfect for manufacturers of everyday products that require clean, defect-free surfaces. NRW-504UV is an essential and invaluable addition to any cleanroom and lab, helping to ensure safe and accurate standards of product quality.