Used NIPPOLY ENGINEERING DD-20NX5-0 #9396807 for sale
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ID: 9396807
Vintage: 2008
Scrubber
Processing air volume: 14 m³/min
Power supply: 1.5 kW, 50 Hz
2008 vintage.
NIPPOLY ENGINEERING DD-20NX5-0 wafer and mask scrubber is designed specifically for the most intricate cleaning needs of today's semiconductor technologies. The scrubber is compact and lightweight, yet highly efficient in its performance. Its primary function is to remove particulate matter from small substrates such as wafers and photomasks. DD-20NX5-0 wafer and mask scrubber features a powerful face suction system which provides exceptional contact force with small substrates. This ensures that even the tiniest particles are successfully removed, providing a clean and safe environment for critical semiconductor components. The scrubber is also equipped with a high-speed motorized brush for the thorough, efficient removal of particulate matter. This brush further diminishes any deposits that are missed by the face suction system. NIPPOLY ENGINEERING DD-20NX5-0 comes equipped with a variety of performance and safety features to ensure optimal cleaning performance. Its double-arc-shaped nozzle ensures that the scrubber is in a stable, consistent orientation during use. The multiple-level watertight seals increase the integrity of the scrubber to avoid any spills due to a clog or malfunction. Also, the scrubber is able to automatically detect any lack of water, providing a warning alarm to users and automatically stopping the scrubber to prevent any damage. The scrubber's flexible design also allows for a wide range of motion for hard-to-reach surfaces. This allows for maximum contact and cleaning power, providing a thorough clean for delicate substrates. Furthermore, the unit is equipped with selectable modes for wet and dry cleaning, allowing it to adjust to a variety of semiconductor process requirements. In summary, DD-20NX5-0 wafer and mask scrubber is a highly efficient and reliable solution for small substrate cleaning. Its compact size, variable design, and numerous safety features make it an outstanding solution for delicate semiconductor component cleaning.
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