Used ONTRAK DSS 200 #130356 for sale

ONTRAK DSS 200 is a wafer and mask scrubber that is used in commercial and research settings to clean and care for thin film photomasks and silicon wafers. This scrubber is designed with cutting edge technology to provide precise and precise cleaning of substrates without damaging them. It is a reliable, cost-effective solution to keep thin film photomasks and wafers operating properly and in an optimal condition. ONTRAK DSS-200 comes equipped with a high-resolution imaging system that allows it to scan wafers at up to 4K resolution, providing detailed and accurate cleaning results. This advanced imaging technology allows the scrubber to detect surface irregularities, pinpoint the cleaning intensities needed, and provide necessary corrections. Additionally, it is capable of capturing root cause evaluation of contamination, allowing for an effective and efficient cleaning process. The scrubber is equipped with dual scrubbing brushes for superior scrubbing power. These brushes are made of Teflon fibers and are powered by advanced brushless motors. The brushes are also designed to self-adjust, ensuring that they efficiently and effectively remove any contamination from the substrate's surface. The integrated auto-cleaning mode also ensures that the brushes stay clean and debris free. DSS 200 also features a number of safety features that make it an ideal choice for protecting both operators and substrates. It features a low-harmonics touchscreen control panel, a user-friendly ergonomic design, and on-board training modules. The scrubber is also designed to be dust and sweat proof, making it suitable for operation in a variety of conditions. The scrubber's advanced design further allows for easy operation, allowing users to easily switch between an automated and manual cleaning mode. The scrubber can be installed on a variety of different production lines, including those that handle cleanroom, ultra-cleanroom, GPD and others. In summation, DSS-200 is a state-of-the-art wafer and mask scrubber that is ideal for keeping thin film photomasks and wafers clean and functioning properly. Its advanced imaging system and high-resolution imaging technology give it unparalleled precision, while its brushless motors, Teflon fibers and self-adjusting brushes provide superior scrubbing power. Finally, its user-friendly design, on-board training modules and dirt and sweatproof structure make it ideal for operation in a variety of different production environments.