Used PSC CLEANING SYSTEMS INC ES523K448AST-480 #165384 for sale

PSC CLEANING SYSTEMS INC ES523K448AST-480 is a wafer & mask scrubber designed specifically for removing surface contamination from semiconductor wafers and masks. This scrubber features a vacuum cleaning chamber that can accommodate both standard-size (30 cm) and large-size (up to 300 cm) wafer and mask pieces. The scrubber utilizes a unique dual-ended cleaning unit for removing particles. The upper portion of the unit is made up of solid rubber rollers, which rotate and scrub the surface of the semiconductor wafer or mask, while the lower portion is composed of soft, squeegee-like blades which help to collect and remove any loose particles from the surface of the wafer or mask. ES523K448AST-480 scrubber also features a built-in dual-stage filtration system for collecting contaminants. The primary filter is a sintered stainless steel mesh which removes most particles, while a secondary filter consisting of a corrosion-resistant mesh further filters the air before it is exhausted out of the scrubber. Additionally, the scrubber is equipped with a digital interface, which displays the status of the scrubber and allows the user to remotely control and monitor its performance. One of the main features of PSC CLEANING SYSTEMS INC ES523K448AST-480 scrubber is its ability to operate at very low pressures, which is beneficial when working with delicate materials like micro-machined surfaces. This low-pressure operation allows the scrubber to operate safely and efficiently, while also saving time and energy. Additionally, the low-pressure operation eliminates potential damage to sensitive materials, as the scrubber only works with a minimum pressure to reduce scrubbing force. In terms of safety measures, ES523K448AST-480 scrubber is equipped with an emergency stop button, which disables the machine if a hazardous condition is detected. Additionally, the scrubber includes a nitrogen purge system for rapid evaporation of moisture, preventing corrosion and further damage to the wafer or mask. PSC CLEANING SYSTEMS INC ES523K448AST-480 scrubber has a number of advantages over other methods of cleaning semiconductor wafers and masks. Its low-pressure operation makes it perfectly suited for use on delicate and sensitive surfaces, while its built-in filtration system ensures clean and safe operation. Its features make it an ideal solution for labs looking to quickly and safely remove surface contaminants from their semiconductor wafer and mask pieces.