Used RAMCO MK36CSS / TPM #9353081 for sale

RAMCO MK36CSS / TPM mask and wafer scrubber is a high speed, chemical scrubbing solution designed for reliably removing particles from masks and wafers used in semiconductor fabrication. The scrubber utilizes a unique motion-synchronized equipment of scrubbing brushes and a steady spray of DI water which work in unison to ensure high production yields with minimal quality defects. It can also be optimized with additional features to provide for a highly customizable and efficient scrubbing process. MK36CSS / TPM mask and wafer scrubber is equipped with a single-axis mechanism that operates at up to 4200 rpm, allowing it to scrub wafers and masks at speeds unsurpassed by any other scrubber on the market. This speed helps to ensure an efficient and safe cleaning process to reduce particle contamination while simultaneously maintaining production yields. The scrubber is also capable of processing wafers and masks with dimensions up to 8" in diameter and up to 8" in thickness. The unique motion-synchronized scrubber heads combined with an adjustable DI water misting feature ensures that contaminants are effectively removed without scratching. The upwardly-angled scrubber heads also help clear particles that have been adhered to the wafer by suction. The scrubbing cycle of RAMCO MK36CSS / TPM is designed in such a way that masks and wafers are first rinsed with DI water and then scrubbed in a conservative manner, reducing the amount of scrubbing chemistry usage to ensure long-term performance. MK36CSS / TPM also comes equipped with a secure seal system that prevents organic particles from entering the wafer or mask chamber, thus helping to reduce potential particle contamination within the scrubbing unit. It also incorporates cooling fans for providing a configurable temperature above 140°F as well as sensors that monitor the level of DI water within the machine, helping to ensure that the scrubbing process remains safe and optimal. RAMCO MK36CSS / TPM offers a superior mask and wafer scrubbing solution that is both effective and reliable. Its single-axis mechanism operates at speeds unmatched by any other scrubber on the market, and its motion-synchronized scrubber heads, adjustable DI water misting feature and secure seal tool allow it to provide an efficient, low-contamination process that helps to ensure exceptional cleaning performance with minimal quality defects.