Used RISHUO ENTERPRISE C2010-01 #293642040 for sale

RISHUO ENTERPRISE C2010-01 is an advanced wafer and mask scrubber designed to clean both fragile semiconductor substrates and complex photomasks. This machine is able to work with a range of particle sizes, allowing operators to easily scrub away defects, contaminants, resist residues and other types of unwanted particles without damaging sensitive wafers and masks. The machine comes equipped with a vacuum-absorbing system and an innovative scrubbing brush filtration system. This helps to keep the cleaning process efficient and avoid the risk of contamination due to cross-contamination and air contamination. The scrubbing brushes are designed to help ensure a uniform and consistent scrubbing that does not cause any damage. C2010-01 also comes equipped with a water and cleaning solution tank that is capable of accommodating a variety of different operating conditions. This tank can also be temperature-regulated and allow for more sensitive cleaning operations if needed. The machine is capable of cleaning all metals, Organic Photo Resist (OPR) residues, and dry photoresist residues without damage. Additionally, it can be used to remove contaminants including ions, dust, siloxane and YAG particles, among others, without leaving behind any unwanted residues. RISHUO ENTERPRISE C2010-01 also features a high-end automated routine washer cycle that allows operators to program automatic cleaning and masking processes, offering greater efficiency and reduce the risk of human error. Additionally, the machine also features built-in laser sensors to rapidly provide accurate and reliable wafer data without errors. This allows operators to have greater control over the cleaning process and helps to avoid unnecessary exposure of harmful particles to the wafer or mask. Finally, C2010-01 has a robust construction and comes with a variety of different components, such as brushes, solvents, detergents and viscosity oils, for different types of cleaning and substrate. Furthermore, the machine comes with a comprehensive maintenance plan and service guarantee, which ensures consistent and reliable performance over time. In summary, RISHUO ENTERPRISE C2010-01 is an advanced wafer and mask scrubber that has a wide range of features and capabilities to give operators greater control, cleaning efficacy, and a reliable maintenance guarantee. This machine is an ideal solution for anyone who needs to clean both delicate semiconductor substrates and complex photomasks.