Used ROTHSE RR 6141 #9294531 for sale

ROTHSE RR 6141 is an automated equipment solution designed for use in semiconductor manufacturing processes and wafer mask scrubbing applications. RR 6141 is a horizontally mounted, self-contained, and fully automated wafer mask scrubber that utilizes an oscillation motion and has three separate cleaning modes single-sided cleaning, double-sided cleaning, and multi-layered cleaning. ROTHSE RR 6141 is designed to perform a variety of scrubbing operations. Firstly, RR 6141 can conduct single-sided scrubbing operations, that is, it can be used to clean one side of the wafer and mask in a single run. Secondly, it can perform double-sided scrubbing operations, allowing it to complete both sides of the wafer and mask in a single pass. Lastly, ROTHSE RR 6141 is capable of multi-layered scrubbing operations, allowing it to complete various depths of cleaning across multiple layers of a wafer mask. RR 6141 is designed to operate at a maximum speed of 2000 rotations per minute, which provides a thorough and consistent cleaning performance. ROTHSE RR 6141 is equipped with a variety of features that support efficient operation and use. The appliance houses an intuitive digital control equipment and user-friendly interface, allowing it to be accurately configured to the desired cleaning task. RR 6141 offers a wide range of process parameters, allowing users to select their desired parameters such as the direction of the oscillation motion, the frequency of the oscillation, cleaning cycle duration, and dwell time. ROTHSE RR 6141 also houses sensors and monitors to maintain proper operations and alert users to potential maintenance issues. RR 6141 utilizes a gas management system which constantly samples the cleaning solution and monitors levels of oxygen and ozone. The appliance is also fitted with an automated inspection unit which scans the surface of the wafer and masks to ensure they are clean. ROTHSE RR 6141 can be integrated into existing production lines or used as standalone unit. The appliance is equipped with a modular design which allows it to be easily rearranged and configured to suit changing production needs. Furthermore, RR 6141 is also class-100 rated and utilizes synthetic Nitrile gloves and HEPA filters to provide users with compliant with cleanroom requirements. In conclusion, ROTHSE RR 6141 is a comprehensive and highly efficient solution for wafer mask scrubbing applications. The appliance offers various scrubbing modes, intuitive digital control, and a wide range of process parameter configuration. The appliance is also equipped with automated sensors and an inspection machine to maintain efficient operation and maintain cleanroom requirements.