Used RUDOLPH FE VII/IV #9398260 for sale

RUDOLPH FE VII/IV is a wafer and mask scrubber used in semiconductor manufacturing. The device is powered by four independent motors that control its scrubbing, surveillance, and sanitation capabilities. The scrubbing process is designed to help reduce the amount of contamination on the substrate during the fabrication process. It uses a patent-pending rotating arm technology to rotate scrubbing heads around the entire surface of the substrate. The surveillance feature allows operators to observe the status of the scrubbing arms and easily make adjustments while the sanitation feature helps ensure the highest cleanliness of the substrate. The FE VII/IV is capable of scrubbing wafers up to 18" in diameter and 1.36" thick. The scrubbing process is state-of-the-art, utilizing hardened carbide and soft bristle brushes to clean particles from the surface of the substrate. These rotating brushes work to penetrate hard to reach areas that may not be easily visible with manual scrubbing. The scrubbing process may also be programmed and customized to suit specific process requirements. The FE VII/IV is also equipped with a 1000 watt vacuum system to collect any particles scrubbed off of the substrate. This vacuum system works to reduce airborne particles from reaching the surrounding environment, improving both efficiency and cleanliness of the substrate's surface. Additional features of the FE VII/IV include a compact body and energy efficiency. The compact body allows for easy installation in place and requires minimal space in a facility. The device also runs on only 12V DC, reducing the energy usage of other scrubbing solutions. RUDOLPH FE VII/IV wafer and mask scrubber is an effective solution for keeping substrates clean during the semiconductor fabrication process. The rotating scrubbing arms, surveillance and sanitation capabilities, and energy efficiency make it a top-of-the-line solution for any manufacturing facility.