Used SCHMID 352 #9124716 for sale

Name: SCHMID 352
Brand: SCHMID
SKU: 9124716
Availability: InStock

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Wafer & Mask Scrubbers

Manufacturer

SCHMID

Model

352

ID: 9124716

Vintage: 2009

Phosphor doper Wafer thickness: 200 μm to 320 μm Capacity: 3600 Cells / h at wafer 125 x 125 mm (1.5 M/min feed) Ambient temperature: 20 - 24°C ± 2°C Humidity: 48% to 54 % ± 2 % Phosphoric acid Concentration approx: 27% Mixing ratio: 1:3 With 85% acid Consumption approx: 0.4 l/h Temperature: 34°C ± 1°C (Internal regulation) Content vaporizer approx: 3 l Content supply tank: 50 l Water inlet belt cleaner: DI water Conductance: 1 μS Temperature: 20°C ± 3°C Consumption: 380 l/h at 2 bar inlet pressure Inlet pressure: < 4 Bar Working pressure: 3 Bar Cooling water: Infeed temperature max: 17°C Consumption: >300 l/h Inlet pressure max: 5 Bar Pneumatic: Inlet pressure: 6 to 10 bar Working pressure: 6 Bar Pollution: Drying Oil free Maximum: 5 μm / 5 mg/m3 Suction Working pressure: 0.5 Bar Connection dimension: 90 mm Exhaust air approx: 100 m3/h Power supply: 3-Stages /N/PE, 400 VAC, 50 Hz, 24 VDC, 8 A / Stage, 5.5 kW 2009 vintage.

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SCHMID 352 wafer & mask scrubber is a versatile, highly efficient tool designed to meet the needs of high-performing semiconductor processing departments. This wafer & mask scrubber utilizes the latest scrubbing technology to deliver fast, accurate, and reliable results. It is capable of scrubbing wafer diameters up to 152 mm and mask diameters up to 350 mm. 352 provides a full range of motion, allowing for the scrubbing of complex structures. Rotational motion, vertical adjustment and adjustable scrubbing speed can all be utilized to optimize the scrubbing performance. This flexibility is useful for different scrubbing tasks like cleaning off thick layers of photoresist and removing particles without damaging delicate structures. This wafer & mask scrubber is equipped with two powerful SCR motors and features adjustable pressure and scrubbing control. This ensures that the entire scrubbing process is both fast and effective. Its sturdy construction and quenching effect helps maintain the highest levels of cleanliness and precision. SCHMID 352 is equipped with a special evacuation arm and a patented double-sided bristled brush to enable intensive scrubbing of even awkward structures. This is done without the need for manual cleaning of the brush, thereby improving process speed and safety. This wafer & mask scrubber is able to operate in a wide temperature range, from 14-44°C. Additionally, 352 features a 1000-litre-per-hour water purification system, which keeps the scrub solution constantly clean and pure, reducing chemical usage and footprint. This system is connected to a closed-loop filtration system, which recycles the scrub solution and helps reduce pollution. In conclusion, SCHMID 352 wafer & mask scrubber is a highly efficient and reliable tool that offers unmatched scrubbing performance. With its simple design and advanced scrubbing technologies, it provides fast, flexible and safe scrubbing processes, as well as reducing process cost and pollution.