Used SCREEN SS-3100 #9284575 for sale

SCREEN SS-3100 is a high-efficiency wafer and mask scrubber. It is designed to reduce particle contamination on semiconductor wafers and photomasks in semiconductor production. It is able to clean both wafer and mask surfaces with low amounts of force, reducing stress and strain that can cause warped or damaged surfaces. SS-3100 is able to remove contamination from the surface by using ultrasonic vibrations to remove even microscopic particles from the surface. This provides the highest possible cleanliness for the wafer or mask, eliminating any defects that the contamination could cause. It is an all-in-one wafer and mask scrubber that uses air powered brush-heads to provide uniform scrubbing. The individual brush-heads can rotate independently in both directions, and are positioned in close proximity to the surface for optimum cleaning. The scrubber is also equipped with an automated protection system that prevents the force applied to the surface from exceeding the recommended levels set by the manufacturer. The scrubbing action of SCREEN SS-3100 is able to remove both fine particles and the surface amorphous layer of contamination on the wafer or mask. This provides a high rate of cleanliness and a homogeneous cleaning result. Additionally, the scrubbing action does not cause damage or destroy any of the mask or wafer marking. In addition to the efficient cleaning action, SS-3100 also offers intuitive and user-friendly operation with built-in LCD touch-SCREEN panels. Easy-to-understand pictograms simplify the setting of the parameters for different cleaning operations. It is also equipped with built-in air filtering and purification systems which ensures a perfectly uncontaminated environment for all cleaning operations. Overall, SCREEN SS-3100 provides high-efficiency wafer and mask scrubbing that eliminates surface contamination and eliminates the possibility of surface defects caused by microscopic particles. Its intuitive operation, high-precision scrubbing action, and air filtering and purifying systems make it the ideal tool for all wafer and mask scrubbing operations.