Used SSEC 10/50 Evergreen #9263207 for sale

SSEC 10/50 Evergreen is a wafer and mask scrubber and cleaning equipment designed for the efficient removal of particles, contaminants, and/or water from printed circuit boards, semiconductor wafers, small parts, photomasks, and related surfaces. The system consists of a rotary suspended wafer scrubber, utilising two counter-rotating brushes with a variable frequency drive. SSEC 10/50 Evergreen has an advanced air-flow unit that ensures a consistent and uniform cleaning action. The machine is equipped with a powerful motor that drives the two counter-rotating brushes. This design promotes longer brush life, superior scrubbing performance, and negligible brush shedding. The brush rotation speed is regulated and maintained by a variable frequency drive. The machine is a closed loop tool and monitors the scrubber pressure as the brushes spin to ensure the softest scrubbing action. The scrubber has a stainless steel construction for optimal durability and a clear, sealed safety cover for operator protection. The scrubber itself is continuously adjustable in height to accommodate various substrate sizes and applique removal requirements. There is an integrated rinse asset which uses filtered de-ionized water to control particles and removing unwanted layer residue on the wafers and masks. SSEC 10/50 Evergreen is a flexible and economical solution that is suited to large and small production runs. It can be used on various types of substrate materials, from traditional layer coated wafers to copper-lined interconnecting boards and even flexible films and ribbons. The model complies with safety standards and supports particle and contaminant removal to meet pro-active customer requirements. In conclusion, SSEC 10/50 Evergreen Wafer and Mask Scrubber is a robust and efficient solution for the removal of particles, contaminants, and/or water from printed circuit boards, semiconductor wafers, small parts, photomasks, and related surfaces. This equipment provide excellent scrubbing performance, coupled with an advanced air-flow system and integrated rinse unit for optimal contaminant and particle removal.