Used SSEC 10 #9395558 for sale

SSEC 10 is a wafer & mask scrubber designed to provide a clean surface and substrate cleaning process in the semiconductor industry. This scrubber is a two stage cleaning machine, providing superior cleaning results. The first stage involves the cleaning of both surfaces of the wafer & mask by using two stainless steel brushes that rotate and gently scrub the material without any damage to the masking layer. The pre-dosed chemicals are applied to the substrate in order to ensure that both the surface and underneath the mask are both cleaned effectively. After the scrubbing is completed, the wafer & mask pass onto a washing stage to be rinsed and dried, making the surface ready for further processing. 10 scrubber offers a wide range of features and benefits such as: its ergonomic design, a high quality stainless steel sprocket, a transparent chiller to improve reaction time, non-abrasive cleaning brushes, an adjustable water temperature, a high resolution digital touch screen allowing for precise control over the cleaning parameters, and an automated tank system which can be upgraded with additional stages of cleaning for different types of substrates. In addition, the scrubber is also equipped with a controllable cleaning nozzle, which can provide a wide range of flow rates for various cleaning levels, while simultaneously allowing for the adjustment of the cleaning agent temperature. Furthermore, the scrubber is designed with an integrated vacuum system which allows for a complete cleaning of the wafer & mask before the pre-dosed chemicals are applied. SSEC 10 wafer & mask scrubber is highly efficient and offers a wide range of features that are designed to provide the highest level of performance and reliability for substrate cleaning. This machine is suitable for various production line applications and is designed to optimize the cleaning process while drastically reducing the time needed to complete the operation. Through its automated cleaning process, this machine ensures that wafer & masks are cleaned quickly and without any damage.