Used SSEC 1756 #9018957 for sale

SSEC 1756 is a wafer and mask scrubber designed for use in semiconductor fabrication facilities. It is specifically designed to safely remove unwanted particles and contaminants from both wafer and photomask surfaces. The scrubber is designed to minimize the risk of yield loss and contamination during critical photolithography operations. 1756 is an automated equipment with a high-vacuum generator, manual control unit, and optional scrubber head. The custom designed scrubbing head can accommodate both flat and contoured wafers and photomasks and can be tailored to the process parameters and substrate shape. The scrubbing head utilizes a single or double-pass system with adjustable scrubbing pressure and compression for optimal control and flexibility. The scrubber is designed to automatically adjust itself to the exact position and location on the wafer or photomask surface. This positioning aids in the removal of unwanted particles without compromising substrate integrity. Additionally, the scrubber head features an electronic wafer alignment unit to reduce scrubbing misalignment. The scrubbing action can be customized to the specific requirements of the substrate and process. The scrubbing media is constructed from a soft, porous material and is designed to wick away any residue build-up. The scrubbing action is electrostatically driven which produces a lower-friction, more consistent process. The optional inline particle monitoring machine provides accurate data regarding the particle level in the process chamber. This data can be used to adjust the scrubbing process in order to further enhance the performance and accuracy of the scrubbing process. The scrubber is also designed to be as safe and user-friendly as possible. All components are ergonomically designed to reduce fatigue, and the design of the scrubber provides an extended service life and safe operation at all times. The controls are also simple and straightforward, making it accessible to a variety of users. Overall, SSEC 1756 is designed to provide the highest level of scrubbing performance and particle detection while optimizing safety and user-friendly operation. Its advanced features and ability to clean both flat and contoured substrates provide an incredibly valuable tool to semiconductor fabrication facilities.