Used SSEC 300 ML Evergreen Series III #9140 for sale
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ID: 9140
Wafer Size: 12"
Vintage: 2000
Substrate cleaner, 12"
Applications:
Solvent cleaning
Resist stripping
Polymer or flux removal
Automatic brush scrub
High pressure spray: 3000psi
Windows interface
Chemistry handling in pullout drawers
2000 vintage.
SSEC 300 ML Evergreen Series III is a high-performance wafer and mask scrubber equipment designed for today's demanding semiconductor fabrication processes. The system offers an advanced range of scrubbing parameters to accommodate a variety of wafer sizes, materials and surface finishes. The unit is composed of three main components: a wafer scrubber, a mask scrubber and a wafer holder. The wafer scrubber is designed to adhere to a more aggressive scrubbing process than the others, while minimizing process time and contamination levels. The high-precision mask scrubber is designed to achieve optimal deposition uniformity, maintaining a high level of cleanliness and precision. The wafer holder holds up to six 6" wafers stacked vertically to maximize wafer throughput. The wafer scrubber includes a two-stage process, featuring pre-scrubbing and post-scrubbing cycles to minimize wafer contamination. Pre-scrubbing utilizes an abrasive slurry, or cleaning solution, to remove residue from the wafer surface before the post-scrubbing cycle. The post-scrubbing cycle is designed to further reduce the number of residual particles on the wafer surface by providing uniform scrubbing coverage. The mask scrubber utilizes a single-stage cleaning process and consists of a series of sponges, small brushes and micro-abrasives to remove debris and oxidation debris. The sponges dislodge particles that are adhered to the mask surface while the brushes are designed to gently brush off light residue. The micro-abrasives remove oxidation and corrosion, which can lead to the reduction of mask etched linewidths. To optimize performance, SSEC 300ML EVERGREEN SERIES III machine is provided with an automated wafer and mask scrubber station. The scrubber station enables operators to quickly and accurately program better than human scrubbing parameters for various wafer and mask sizes, materials and surface finishes. Automated scrubbing processes also allow for faster throughput and improved lithography uniformity and accuracy. 300 ML Evergreen Series III is an ideal choice for the fabrication of integrated circuit devices, optical systems and other semiconductor applications that require precise polished surfaces with no contamination. With its automated, high-precision scrubbing processes, the tool delivers consistent wafer and mask surfaces, free of debris and oxidation, for optimal lithography uniformity, accuracy and yield.
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