Used SSEC 3300 #161552 for sale

SSEC 3300 is a wafer and mask scrubber designed for cleaning and stripping thin and fragile surfaces. It is a high-capacity, high-speed scrubber that can handle up to 150 wafers or 30 masks at a time. It uses an abrasive disk made of a soft, non-abrasive material, such as felt and a closed-loop water system to provide a controlled, consistent cleaning action. The abrasive disk rotates on a vertical axis and is adjustable to five speeds, allowing for a customized cleaning action that is gentle enough to prevent surface damage while removing contaminants. The design of 3300 includes a circular scrubber head that is clamped onto the wafer or mask and sprayed with a water-based cleaning solution. This scrubbing action is further supplemented by an adjustable shower nozzle that allows for the release of pressure, enabling a controlled and consistent cleaning. The scrubber features a high-speed, liquid-cooled motor for efficient processing, with a maximum scrubber rotation speed of up to 36,000 RPM. SSEC 3300 also has a timer with up to three timing control cycles, allowing for accurate and repeatable cleaning. An independent water valve allows for easy control of the scrubbing flow, enabling different concentrations of cleaning solution in order to achieve the desired cleaning results. A pressure gauge is available to monitor the flow rate, allowing for control of the scrubbing force and pressure. 3300 is designed for safety, with features such as a non-skid base, a safety switch for automatic shut-off when the scrubber is operated without a wafer or mask in place, and a built-in dryer to ensure proper drying and avoid water spot. Additionally, the scrubber has an exhaust system to ensure proper ventilation and alcohol detection to check for ethanol contamination in the water system. Overall, SSEC 3300 is a high-performance and reliable wafer and mask scrubber that allows for efficient, safe and gentle removing of unwanted contaminants from delicate surfaces. Its combination of adjustable speed, pressure and liquid-cooled motor make it an ideal choice for any wafer or mask cleaning procedure.