Used SSEC 3300 #9205591 for sale

SSEC 3300 wafer & mask scrubber is an automated cleaning system that is designed for use in semiconductor manufacturing and other precision coating processes. It provides a thorough and efficient cleaning process by using a stream of delicate scrubbing fluid that is continuously fed to the surface of a wafer or mask. The unit offers a variety of settings to ensure that the proper cleaning processes are achieved for different materials and purposes. 3300 wafer & mask scrubber has an integrated design based on the latest technologies and optimized for quick and efficient operation. Its design incorporates a number of features that help to maximize cleaning performance and minimize cycle time. The scrubber features a unique scrubbing fluid delivery system with adjustable flow, pressure, and rotation speed settings to tailor the scrubbing process for various types of substrates and cleaning applications. Additionally, the scrubber offers real-time control panels for monitoring and regulating the cleaning process. The scrubber utilizes both mechanical and chemical cleaning actions to effectively remove various types of surface contaminants. The mechanical scrubbing action is achieved by a rotating soft brush that is brought in contact with the substrate's surface. The brush bristles act like a scrubbing pad to remove surface debris, dust, and contaminants. A variety of different scrubbing fluids can be used to enhance the cleaning process. The scrubbing fluid is then forced through jets around the perimeter of the scrubber and onto the substrate's surface. The presses and flushes the surface debris and contaminants from the cleaning surface as well as cleansing the substrate's surface from any residue left behind. The scrubbing fluid is then quickly drained away, taking with it any dirt, dust, and contaminants that have been lifted. The combination of mechanical and chemical cleaning processes used in SSEC 3300 wafer & mask scrubber results in superior cleaning quality and efficient operation. The unit also offers a range of advanced safety features, including automatic shutoff if the scrubbing fluid is low, allowing it to be used without fear of causing damage to delicate substrates and coverings. With its user-friendly design, compact size, and superior cleaning efficiency, 3300 wafer & mask scrubber is an excellent choice for any semiconductor or precision coating application.