Used SSEC 3300 #9225597 for sale

SSEC 3300 is a wafer and mask scrubber manufactured by Suss MicroTec, Inc. It is designed to reduce surface contamination of wafers and masks prior to application of photoresist during device fabrication processes. 3300 uses a combination of ultra-sonic and jet scrubbing technologies to achieve a high-quality result with minimal damage to the substrate. SSEC 3300 operates with a power consumption of 5.5kW and a rated pressure of 3.2MPa. It provides a cleaning variable of up to 128 different cleaning cycles settings and 5 nozzle configurations. The unit comes equipped with an adjustable oscillation frequency, providing excellent control of scrubber parameters. The scrubber is designed with a 200mm diameter cleaning bed and has a capacity of up to 20 wafers/mask. It also has a 3-axis robotic arm for loading and unloading wafers. 3300 uses a turbomolecular vacuum pump in order to create a high level of vacuum in a closed chamber. This is necessary to ensure that particles, debris, and other small particles are completely removed from the wafers during the scrubbing procedure. The vacuum function also pushes the scrubbing solution into the targeted area. This makes the scrubbing process highly effective, and ensures that there are no sterile pockets left behind. The scrubber's pressure control equipment is designed to ensure even distribution of scrubbing pressure over the entire surface of the wafer and mask during each cycle. SSEC 3300 also has a monitoring system, which provides accurate monitoring of parameters such as operating pressure, water flow rate, and temperature. This ensures consistent high-quality results. 3300 is designed with a programmable logic controller to control and monitor all the parameters of the scrubber. This helps to provide consistent results and efficient operation. Additionally, the unit has an advanced UV LED unit for radiation sterilization. This machine can be used to sterilize the wafers and masks after scrubbing, to minimize contamination. Overall, SSEC 3300 is an effective wafer and mask scrubber designed to reduce contamination prior to application of photoresist during device fabrication. With its advanced technology, it offers excellent surface cleaning, as well as accurate monitoring and control of parameters. It is designed to provide efficient operation, consistent results, and a high-quality finish.