Used SSEC 3300 #9302847 for sale

SSEC 3300 is a wafer and mask scrubber designed to clean standard semiconductor substrates for lithography processing. The equipment features a low-pressure, constant torque glass roller system that allows particles and debris to be removed from the substrate without causing any damage. The scrubber also offers a choice of programmable settings allowing different levels of scrub pressure to be applied to either flat or curved surfaces. The scrub pressure can be adjusted to ensure maximum efficiency while maintaining the integrity of the substrate. The unit operates in cleanroom environments and is constructed with Teflon-coated stainless steel platform and rollers to help reduce static buildup and contamination. The Teflon coating helps to ensure that the substrate is cleaned thoroughly as it is free of residue buildup, which could lead to production defects. The machine is also equipped with an ultraviolet (UV) light to help in killing airborne microorganisms and reducing the potential for contamination. 3300 is also equipped with a high-capacity vacuum to collect particles and debris and ensure complete removal from the substrate. It features an adjustable speed-controlled stirring mechanism for easy cleaning of the substrates. Additionally, the adjustable speed control allows for controlled patterns of cleaning, which can reduce wastage and improve yields from production processes. The tool can be easily programmed to operate automatically and can be easily integrated into a production line. It is designed to be durable, reliable, and easy to operate and can be used for a variety of cleaning processes within a production line. Furthermore, SSEC 3300 allows for custom programmability for different types of substrates and applications, making it a versatile and handy tool. Overall, 3300 is an efficient and effective high-performance asset which is suitable for standard semiconductor substrates. Its variable scrub pressure and adjustable speed-controlled stirring mechanism, allows for superior particle and debris removal while ensuring substrate integrity. Its durable, low-maintenance construction, reliable performance and comprehensive programmability makes SSEC 3300 an ideal choice for any lithography production line.