Used SSEC 3300 #9302848 for sale

SSEC 3300 is a wafer/mask scrubber designed to remove particles, organic compounds and other contaminants that can degrade the quality of photosensitive surfaces or adversely affect yield during the lithography process. The equipment is a single-sided planar (SSP) rotator configured with a three-step process that uses three different wet chemical and rinsing baths to remove contaminants from the wafer or mask. 3300 includes a wet bench that includes the primary wafer/mask processing chamber that accommodates up to six 300mm wafers or masks, an auxiliary chamber for accommodating up to two 150mm wafers or masks, and a third large cycle container for accommodating up to two 450mm wafers or masks. The wet bench of the system also includes a lift mechanism and a steam generator, as well as temperature and pressure sensors. The wafer/mask scrubbing process involves the following three steps: pre-rinse, scrub, and post-rinse. In the pre-rinse step, the wafer/mask is first immersed in an ultra-pure water to remove particles, and organic compounds from the surface of the wafer/mask. After this, the wafers/masks are scrubbed in a semi-aqueous, chemistry-based solution like solvent, which emulsifies and removes particles, organic compounds and other contaminants from the wafer/mask. Finally, the wafer/mask is rinsed in a second ultra-pure water bath, which removes the remaining contaminants. SSEC 3300 also features a powerful air-conduction circulation unit which helps to ensure that the solutions in the chamber are always in motion and at consistent temperature. This helps to increase the wafer/mask scrubbing process. In addition, the machine also includes an automatic wafer/mask loading and unloading tool which increases efficiency in the wafer/mask scrubbing process. The asset is easy to operate, and can be customized to the specific scrubbing needs of any particular application. Its ergonomic design also helps increase operator comfort and decrease fatigue. Finally, 3300 is constructed from corrosion-resistant materials, so it can withstand the harsh corrosive environments of the lithography process.