Used SSEC 3300 #9308967 for sale

SSEC 3300 is an automated wafer and mask scrubber developed by Semes, Inc. that provides exceptionally pure, dust-free substrates and masks. The scrubber uses high-pressure, ionized, and filtered water to remove surface contamination and material build-up resulting from the production of semiconductor devices. The three-stage cleaning process consists of an oscillating spray bar, a vacuum roller, and a spin assist. The oscillating spray bar creates a uniform water pressure and distinct spray pattern which helps to suspend and quickly remove fine dust particles and any other particulate residue during the first stage in the cleaning process. Using an intense spray pattern and adjustable water pressure settings, 3300 can effectively clean up to 150 wafers at a time. The second stage of scrubbing utilizes an adjustable vacuum roller to carefully remove any residue remaining on the wafer surface. The roller is designed to leave the surface clean without having the particles or dust stick to it. A brush can also be used for more difficult particles that may need extra cleaning. Finally, the third stage of scrubbing is the use of spin assist to break up and lift any stubborn particulate build-up. Spin assist can be used at variable speeds to remove difficult contamination. It also assures an even distribution of cleaning agent or rinse on the cleaned wafers. The scrubber is designed to use water from line, filtered and ionized water from a range of conductivity that is controlled by a resistivity meter. SSEC 3300 is ideal for scrubbing wafers and masks that have been exposed to contamination from airborne particles, dust, and mishandling during production. The scrubber is designed for easy operation and simple maintenance to ensure cleaning accuracy and maximum performance. It is equipped with an automated cycle timer, a low-water monitoring feature, and an adjustable manual rinse system, which offer greater control over the cleaning process.