Used SSEC 3305 #9082398 for sale

Wet etching system, 8" 108" Wide x 78" Deep x 105" High, 300 Series SS, white epoxy painted inside and outside PC based user interface with local data storage, SQL based data base - Air Ionizer ULPA air filtration Concentrated chemical containment for 3305 SECS/GEM software for host interface SEMI compliant, ETL listed, CE marked Robotic Wafer Handler: Robot: Vertical, Rotary, 2-Radial Axis Vacuum paddle with flip Wafer scanner with CCD camera for detecting double and cross slotted wafers Wafer alignment with CCD camera, image processing Horizontal Cassette Loading, (2) Cassettes Process Chambers: Halar Chamber, 18" inside diameter CCD Camera for end point detection and video archive Exhaust Pressure Sensor Cover interlock sensor Integrated Spin Chuck Wafer Lift Mechanism Dispense Arm 1: LPD - Etch Solution - HF:Nitric:Sulfuric:Phosphoric:H2O (1:24:4:8:3) Dispense A: High Flow Stream @ 1200ml/Min Dispense B: Fan Spray Purge Cup w/Dual Dispense lid - High Capacity ("Prime" Function to Recirculation Tank) Dispense Arm 2: LPD - DI Water Rinse Dispense A: High Flow Stream Dispense B: Fan Spray Dispense Arm 3: N2 heated dispense - with programmable 400W heater, 0.0003 micron filter Stationary Wall Mounted Dispense (1 nozzle each): Dispense A: Amb DI Water Collection Cup (for chemical separation): Open: Recirculated Etch Collection Closed: Chamber Drain Drain Diverter - Main Chamber Drain: Drain "A" = Acid Drain Drain "B" = Industrial Drain Wafer Thickness Inspection Station: Integrated ISIS Wafer Thickness Sensor and Wafer Measurement Software ISIS Sensor Indexing Arm for complete Edge to Edge Wafer Thickness Mapping Integrated Spin Chuck and Spin Motor CCD Camera for WaferChekTM measurement of Via reveal Plumbing Package: Etch 1: Chem Supply, Mixing, Dispense and Collection - HF: Nitric: Sulfuric: Phosphoric: H2O (1:24:4:8:3) Metering package to support Five Part Mixing - for Four tanks, 1 mix 1 spike Valving package to support Five Part Mixing - for Four tanks 6 Gallon Etch Recirculation Collection Tank - 1 fresh 1 dispense Recycled Etch Filter - 1 micron Bulk Chemical Supply Interface Triple Circuit Heat Exchangers - 40C ±2°C @1200ml Per Min Levitronics Pumps Neslab Heater/Chiller Etch 2: Additional Chemical Supply, Mixing, Dispense and Collection System Metering package to support Five Part Mixing - for Four tanks, 1 mix 1 spike Valving package to support Five Part Mixing - for Four tanks 6 Gallon Etch Recirculation Collection Tank - 1 fresh 1 dispense Recycled Etch Filter - 1 micron Bulk Chemical Supply Interface Triple Circuit Heat Exchangers - 40C ±2°C @1200ml Per Min Levitronics Pumps Neslab Heater/Chiller Drain Diverter (For Collection Cup): Drain "A" = Etch Solution "A" Recirculation Drain "B" = Etch Solution "B" Recirculation Drain "C" = Acid Drain With resistivity monitors Purge Cup w/Dual Dispense Collection Path High Capacity (with "Prime" Function) Dispense Arm Reconfigured with Two Stream Dispenses (Etch A/B). No Fan Sprays Etch 3: Pre-Mixed Etch, Single-Pass, Bottle-Feed, into Chamber #2 Only Etch Spin Tooling: 8" Back Side Gas Seal Chuck with Self Retracting Lift Pins 208 VAC, 3 Ph, 60 Hz, 30 A Currently installed 2012 vintage.