Used SSEC M3302 #9380489 for sale

SSEC M3302 is a high-performance wafer and mask scrubber designed to remove particles and contaminants from lithographic masks and wafer surfaces. Its high performance stem from its efficient design and uses of advanced technologies. Its sophisticated design combines a large scrub area, a sloped surface, and a draining equipment. The scrub area is 35 centimeters in diameter and 0.7 millimeters in depth. This gives a large area for scrubbing and draining, which allows even particles to be effectively removed from the wafer and mask surfaces. The sloped surface is designed to allow water to run off quickly and easily, reducing the time needed for cleaning. SSEC M 3302 scrubber uses a combination of advanced technologies to create a high level of cleaning effectiveness. The scrubbing head is made of a combination of soft and hard materials. The soft material is gentle on the lithographic masks and wafer surfaces, while the hard material is able to remove particles and contaminants effectively. The scrubbing head also uses ultrasonic vibration to help break down and remove particles and contaminants. Additionally, the scrubber has a nozzle system that sprays detergent onto the surfaces being cleaned. This helps dissolve particles and makes them easier to remove. M3302 scrubber also utilizes a combination of filtration technologies. It has two filters at the inlet and one at the outlet of the scrubber. The inlet filters remove particles and contaminants that are larger than 0.5 microns in diameter. The outlet filter ensures that particles that were removed from the surface are completely removed from the unit. Overall, M 3302 scrubber is designed to be an efficient and effective machine for cleaning wafer and mask surfaces. Its combination of technologies helps to ensure that particles and contaminants are removed quickly and efficiently. The scrubber is also designed to be user-friendly and easy to operate, making it an excellent choice for all types of lithographic mask and wafer cleaning applications.