Used SSEC M3303 #9354367 for sale

SSEC M3303 is a wafer and mask scrubber specifically designed to clean standard mask substrates. This equipment is capable of cleaning large areas of the wafer, without damaging any film layers, or causing damage to delicate sensitive electronic components. It has a unique mechanical scrubbing system, which provides efficient cleaning with low mask distortion and minimal residue remaining on the substrate. This product is designed with a wafer table, which can support various sizes of wafers and is also adjustable for different applications. It has a brush movement mechanism that is powered by a stepper motor and is capable of controlling the scrubbing rate, direction, and depth. This unit is also equipped with a specialized software interface which allows the operator to set parameters such as scrubbing speed, pressure, and angle. SSEC M 3303 is integrated with a vapor phase scrubbing machine, which helps to remove oil, dust, and other contamination. This tool also features a powerful vacuum asset which is used to capture residual particles, and prevent them from entering the environment. M3303 also has a unique cleaning chamber, which is designed to maintain a low temperature throughout the scrubbing process. This device is equipped with an integrated cooling model, which allows for safe operation of the scrubbing equipment. M 3303 also features a cleaning bypass system allowing for quick recovery of any chips during the scrubbing process. In addition, the scrubbing rate is adjustable, with a minimum and maximum speed setting, allowing the operator to adjust the rate of scrubbing to the desired range. Furthermore, this unit has a multi-point scrubbing head design, allowing for multiple scrubbing angles and efficient scrubbing of irregularities on the substrate surface. Overall, SSEC M3303 is an excellent wafer and mask scrubber which is designed to provide thorough cleaning with minimal damage to the wafer or mask substrate. It can handle large wafer substrates, including standard masks, and is capable of scrubbing at a precise rate while maintaining a low temperature during the scrubbing process. Additionally, the integrated scrubbing bypass unit and adjustable scrubbing rate allow the operator to adjust the rate of cleaning to the desired range, while the multi-point scrubbing head allows for optimal scrubbing of irregularities on the substrate surface.