Used SVG 18 DWC #58186 for sale
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ID: 58186
Wafer Size: 2"-5"
Vintage: 1987
Double sided wafer cleaner for Si wafers, 2"-5"
Model no: 8120
(2) Brush stations
Cassette to cassette loading
Spin dryer
Missing belts and brushes
Power requirements: 220 V, 50 Hz
1987 vintage.
SVG 18 DWC is a wafer and mask scrubber designed for use within a semiconductor fabrication environment. This scrubber is a three-stage machine consisting of a wafer stage, a mask stage, and a dual-head wafer scrubber. The wafer stage is composed of a single motorized head and four surfaces for scrubbing. Each surface is intended to provide a scrubbing direction in order to remove particles from the surface of the wafer. The mask stage uses an adjustable dual-head scrubber to clean masking materials from the mask surfaces. This stage includes a floating brush for low-pressure cleaning, as well as a spray jet for removing dust, grind sand, and other hard particles from the masking surface. The dual-head wafer scrubber is designed to provide a two-tier process for cleaning wafer surfaces. The first head is designed to use low-pressure scrubbing to remove small contaminants. The second head is designed to use high-pressure spray nozzles to remove larger and more persistent particles. SVG 18DWC is designed to be used in combination with other wafer or mask cleaning machines. It can be used to pre-clean a surface before entering into a wet acid bath, or to post-clean a surface after the wet acid bath has stripped away any larger particles. This scrubber also includes optional liquid detection and monitoring devices, as well as a control module that allows for flexibility in the user's scrubbing procedures. The module includes a visual monitor for monitoring the scrubbing process, as well as a programmable logic controller (PLC) for controlling the scrubbing parameters. Overall, 18 DWC is a reliable, efficient scrubber that is capable of removing both small and large particles from wafer and mask surfaces in semiconductor fabrication facilities. It is a great addition to the range of cleaning machines available for the removal of particles from semiconductor devices.
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