Used SVG 8600 #293827972 for sale

SVG 8600 is an industrial wafer and mask scrubber designed for use in semiconductor production. It deploys an advanced ultra-sonic cleaning technology that provides outstanding performance for scrubbing, cleaning, and removing dust from photomasks. With up to 6 racks and 860mm width, it is capable of accommodating larger photomasks, as well as small dies and large area photomasks. Using advanced ultrasonic cleaning technology and a patented sealing equipment, 8600 provides superior cleaning power while minimizing liquid and solvent used. This feature makes it ideal for sensitive electronics substrates. The scrubber uses high-frequency, low amplitude acoustic waves that pass through a tank filled with standard SC-1 type cleaning agents. This creates hundreds of small, highly efficient, free-standing jets of cleaning solution which remove particles, contaminants, and other impurities from the surface of the wafer and mask. The embedded wafer control system and touch screen provides precise control over scrubbing power, and wafer monitoring is done in real time, making it easy to adjust parameters if and when necessary. The scrubber also has a non-contact hydro-rails wash unit, which means that wastewater from the cleaning process is collected in the hydro-rails tank, reducing the amount of water and solvent used. SVG 8600 has a large, FDA compliant material chamber that can accommodate all types of photomasks - from small dies to jumbo photomasks. To ensure accurate scrubbing and long-term, reliable performance, the scrubber is also equipped with a powerful three-phase vacuum drive roll, which is responsible for the precise, precise scrubbing and proper cleaning of the wafer and mask. Overall, 8600 is a highly efficient, precise and reliable wafer and mask scrubber - ideal for industrial production. It is equipped with a variety of features and functions, such as advanced ultrasonic cleaning technology, a patented sealing machine, non-contact hydro-rails wash tool, FDA compliant material chamber and powerful three-phase vacuum drive roll. This makes it capable of quickly and effectively scrubbing, cleaning and removing dust from photomasks with minimal waste of water and solvent.