Used SVG 8620 SSC / 8636 HPO #9366489 for sale

SVG 8620 SSC / 8636 HPO wafer & mask scrubber is a precision cleaning equipment designed to restore film performance on reticles and address physical defects on wafers. This system is suitable for the removal of debris and contaminants from any surface including photomasks, wafers, resists, mounts or polishing pads. 8620 SSC / 8636 HPO unit features linear and rotary stage movements, regulated air pressure, and multiple nozzle configurations. This allows for repeatable and controllable scrubbing of all types of surfaces. Its robust and adjustable nature allows for a customizable cleaning experience as well as fast cycle times. In order to achieve optimal results, the machine is equipped with dual scrub zones. This allows for additional scrubbing parameters, such as different scrub pressure values or dual scrubbing rates. This arrangement further instills the tool with the capability to process all types of surfaces in one pass. Additionally, the dual scrub zones allow the users to optimize the process recipe based on different reticle designs. The scrub process is driven by Nitrogen gas resulting in significantly higher penetrations into the target area than air driven systems. Its strict control over gas pressure, process pressure, and nozzle design, enables a broad range of scrubbing processes. This includes the capability to process fine line prints, for example. SVG 8620 SSC / 8636 HPO wafer & mask scrubber is an economical solution that offers various benefits. Its advanced features provide superior cleaning performance, improved cycle times, and low scrubbing lifetime costs. In addition, the asset can handle highly intricate and fragile parts, such as planarizing and structuring of resists, thus improving the surface metrics of the substrates. This in turn increases the overall yield of the product. Thanks to its flexible design, 8620 SSC / 8636 HPO tolerates changes in design, reticle shape, size and substrate requirements without additional adaptations. This makes the model suitable for applications in diverse industrial and research settings such as the semiconductor industry or research laboratories. Overall, SVG 8620 SSC / 8636 HPO wafer & mask scrubber is a cost-effective and reliable solution for efficient cleaning and scrubbing of reticles and various substrates. Its advanced features allow for repeatable and optimized cleaning at high throughput and low costs.