Used TEKNEK 400 DS #9234248 for sale

TEKNEK 400 DS is an advanced, high-performance wafer and mask scrubber. It is designed for scrubbing and cleaning wafer patterns and mask substrates prior to applying a protective coating. This scrubbing and cleaning process is critical for the successful manufacture of semiconductor products. 400 DS is a state-of-the-art scrubber that uses a dual-station equipment consisting of a cleaning station and a reusable paper scrubbing station. The cleaning station uses strong-bond cleaning technology, which offers superior cleaning results by eliminating chemical residues that could cause problems with the finished product. The reusable paper scrubbing station utilizes a two-step cleaning and scrubbing process for thorough cleaning and scrubbing of substrates. TEKNEK 400 DS also features a sophisticated, programmable scrubbing motor with variable-speed control to ensure fast and accurate cleaning results. This motor makes it easy to accurately control the scrubbing speed, allowing for efficient scrubbing of wafer patterns and mask substrates. A built-in visibility system allows for monitoring of the cleaning process, ensuring accurate and uniform results. To further ensure high-quality scrubbing results, 400 DS comes equipped with an integrated media-detection unit. This machine automatically detects and identifies the type of media being used in the scrubbing process and adjusts for optimal scrubbing in accordance with the substrate's material. TEKNEK 400 DS also features a touch-screen controller panel with intuitive software for easy setup and operation. The scrubbing cycle time can be easily adjusted to accommodate varying scrubbing times and patterns, as well as multiple cleaning cycles. These features provide users with complete control and a user-friendly experience. 400 DS is a powerful and reliable wafer and mask scrubber that is sure to provide accurate and consistent results. Its cutting-edge features, combined with its intuitive controls and advanced scrubbing motor, make it an ideal choice for efficient and precise scrubbing of wafer and mask substrates.