Used TEKNEK CM40600UP1223 #142278 for sale

TEKNEK CM40600UP1223 is an automated wafer and mask scrubber used in semiconductor manufacturing processes. This scrubber is designed for specific applications that require the most precise removal of impurities, including particle contamination, particles from the teardown process, and general oxide and oxide-related deposits from semiconductor wafer and photomask surfaces. CM40600UP1223 is equipped with advanced cleaning technologies like ultrasonic scrubbing and spin-scrubbing with adjustable shower-head to deliver utmost cleanliness. It features a unique, automated 'no-touch' moving scrub head mechanism, that can rapidly and smoothly move around the wafer or photomask. The scrubber is constructed with a stainless steel two stage scrubbing head platform, which is connected to the scrubber's main body. An advanced microprocessor-controlled brushless motor allows the scrubber head to adjust its scrubbing action in order to achieve the desired surface profile. TEKNEK CM40600UP1223 features a user-friendly GUI, offering great flexibility and easy set-up. It allows for basic and advanced input types, custom user profiles, and intuitive visualization of scrubbing process parameters. By monitoring the process in real-time, the scrubber can detect if any unusual patterns are being scrubbed and immediately correct the scrubbing accordingly. It also offers dual-wheel scrubbing mode, which accelerates scrubbing in order to carry out larger wafer and photomask jobs quickly. CM40600UP1223 is compatible with different types of tanks, including a high purity water, diluted acid, and JEDEC standard cleaning solutions. It is also able to work with a variety of substrates, such as Si, GaAs, Spinel and Sapphire. Its robust construction ensures long-term reliability and offers a degree of flexibility that increases productivity. TEKNEK CM40600UP1223 is a valuable cleaning solution for the semiconductor industry and offers rapid wafer and photomask cleaning. The scrubber's features make it well suited for applications in dielectrics, photomask removing and other surface cleaning operations. It provides maximum cleanliness and the highest levels of surface cleaning quality.