Used TEKNEK CM80600RLF3 #9180564 for sale

TEKNEK CM80600RLF3 Wafer & Mask Scrubber is a revolutionary cleaning solution for semiconductor wafer fabrication. With its advanced scrubbing technology, it can quickly and effectively clean off particles and residue from both wafers and masks. Designed to work in any environment, CM80600RLF3 can also reduce production downtime with its less than two-minute cleaning cycle. TEKNEK CM80600RLF3 operates using two closely-positioned hot air jets to provide a stream of hot air for uniform particle removal. The jets are highly configurable, with adjustable nozzle orientation and air temperature. This ensures that the blasts of hot air are directly targeting any particles, making them easier to remove. The scrubber also features an integrated nozzle swivel, which can move up to 45 degrees horizontally and 30 degrees vertically to provide the most optimal cleaning angle. Thanks to its powerful suction system, CM80600RLF3 can quickly and precisely collect all particles and residue. The system filters out particles as small as 0.2 micron and has an adjustable feathering speed, allowing the user to precisely control suction intensity. The suction system is also adjustable, enabling users to set the right suction power for any kind of task. In addition to cleaning, TEKNEK CM80600RLF3 allows users to quickly and precisely "tweak" their masks after cleaning them. By using the convenience of the nozzle swivel, users can adjust mask settings in the up, down, left, and right directions. It can also serve as a particle counter for incoming and outgoing wafers or masks, allowing for complete traceability in the fabrication process. CM80600RLF3 Wafer & Mask Scrubber is designed to be efficient, reliable, and versatile. Its advanced technologies make it a formidable cleaning solution for semiconductor wafer fabrication, and its scalability allows for future upgrades as needed. With its fast cleaning cycle and precise cleaning power, TEKNEK CM80600RLF3 is sure to bring greater efficiency and cost-effectiveness to any wafer and mask fabrication facility.