Used TEL / TOKYO ELECTRON NS 300 #293614676 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 293614676
Wafer Size: 12"
Vintage: 2006
Wafer scrubber, 12"
Material: Silicon
Utility outlet: Vertical downward
Carrier station block
Carrier stage height: 900 mm
Wafer transport method: Robotics transport method (X, Y, Z, Θ)
Sensor placement sensor
Presence sensor
Mapping sensor
Wafer out sensor
Load port: Bolts / Light
Loader: FOUP
Load port lockout pin: FEOL
Load port indicator
Operator access switch
FOUP Type: (25) Wafers
Kinematic coupling pin
Clamp
Fan Filter Unit (FFU)
AMHS: SHINKO ELCTRIC OHT
I/O Sensor
ES Switch terminal block
Carrier ID reader
Alarm lamp: Red / Blue / Yellow / Green
Direct drain
Digital manometer exhaust monitor
Does not include HDD
Scrubber process station:
Mechanical chuck
Wafer holding method: 6-Pins edge contact method
Wafer fixing method: 3-Points grip method
Wafer sensor
N2 Purge backside liquid contact prevention
Acceleration: 100 to 1,000 rpm (100 rpm/s increment)
Dual band monitor: Alarm rpm bandwidth, stop rpm bandwidth
Alarm / Stop rpm setting range: ±0 to 1,000 rpm
Process recipes: 1000
Recipe steps: 100
Process time setting: 0 to 999.9 sec/step (0.1 sec increment)
Arm: Brush and spray
PVA and PP Brush
Atomized spray nozzle
Flow range: 100 L/min
Basic setting: 0.2 L/min
(2) Side rinse nozzles
ENTEGRIS DIW Filter
Rinse nozzle purge method: Slow leak
ULPA Filter
Rotation speed:
CH2-1, CH2-2: 0, 10 to 3,000 rpm (1 rpm increment)
CH2-3, CH2-4: 0, 10 to 4,000 rpm (1 rpm increment)
AC Power box:
Round terminal for main breaker
Voltage: 208 V
Option:
CCD Camera
Spinner internal lighting
2006 vintage.
TEL / TOKYO ELECTRON NS 300 Wafer & Mask Scrubber is a reliable and efficient tool used in various industries. Primarily used in semiconductor manufacturing and related industries, TEL NS 300 Wafer & Mask Scrubber provides cleaner wafers and masks for improved fabrication process control and yield. Available in a compact and user-friendly design, TOKYO ELECTRON NS300 Wafer & Mask Scrubber is highly effective and efficient for cleaning contaminated and/or sprayed wafers, quartz masks, glass plates, and others. NS300 Wafer & Mask Scrubber is designed with a 120-liter shake/scrub bottom tank, with an adjustable speed for optimum cleaning results. The scrubbing action is conducted by its spinning agitation plate, yielding uniform cleaning from all directions. Not only is the scrub unit highly durable and able to create even clean surfaces, but the noise level is quiet and well within the legal stipulated levels making it appropriate for most environments. TEL / TOKYO ELECTRON NS300 Wafer & Mask Scrubber is equipped with a temperature control equipment and a digital display temperature sensor, enabling users to adjust temperature efficiently and accurately. The scrubber also comes with a drainage system, an automated ultrasonic cleaning unit with many different cleaning cycles, an automatic drain control machine for controlled drainage, and a precise control tool for temperature setting and temperature control. To meet the needs of a variety of platforms, TOKYO ELECTRON NS 300 Wafer & Mask Scrubber also features a large-sized tilt-out window, anti-vibration legs, adjustable air pistols and a wide selection of soaking solutions so users have the flexibility to customize a process to meet their specific requirements. Overall, TEL NS300 Wafer & Mask Scrubber is a powerful, user-friendly and intuitive tool that saves time and money in the production process. Its durable construction ensures NS 300 Wafer & Mask Scrubber can be relied on to quickly and effectively clean wafers and masks, while its temperature control asset and precise control model further enhances process reliability and performance.
There are no reviews yet