Used TEL / TOKYO ELECTRON NS 300 #9391714 for sale

TEL / TOKYO ELECTRON NS 300 is a wafer and mask scrubber equipment designed to meet the needs of the semiconductor industry. It is a fully automated, three-stage scrubbing system that can handle up to 5-inch and 8-inch sized wafers with glass substrates as well as thin-film patterns. Utilizing an enhanced "reverse-flow design" wash manifold, the scrubbing unit is capable of providing an accurate and reliable cleaning process for any combination of wafer materials, sizes, and configurations. To enhance the cleaning results, the scrubbing machine employs both vertical and horizontal sprays to ensure the complete removal of particles from the wafer surface. The patented scrubber design works to maximize particle removal, providing full immersion cleaning with all particles removed from the wafer surface, and any residues being passed away from the wafer surface for collection via a common liquid waste line. TEL NS 300 is equipped with a powerful, multi-head, rotating cleaning wand with a precisely positioned spray that delivers a consistent and controlled cascading action across the entire surface of the substrate. This process helps to reduce particle bumping, reduce re-deposition, and enhance particle removal during the cleaning process. The wafer and mask scrubber also utilizes a powerful chemical pre-soak, ensuring the chemically activated particles are completely removed prior to re-entering the immersion tank. The combination of chemical pre-soak and powerful scrubbing wand significantly reduces the overall time required for a complete clean. To monitor the cleaning process, and ensure its accuracy and consistency, the wafer and mask scrubber have an embedded video tool that allows operators to view the area behind the tank wall. This enhances the operator's ability to remotely monitor the entire cleaning process. Operators can also review and adjust the parameters to optimize the cleaning process. The wafer and mask scrubber is also compatible with a wide range of chemical treatments and detergents available on the market. This ensures the scrubber can effectively clean multiple substrates and chemical compositions with the highest level of accuracy. In addition to the advanced cleaning capabilities, TOKYO ELECTRON NS300 also reduces energy costs by utilizing a counter-current engineering, which helps to reduce water and detergent usage, reduce waste water discharge, and minimize overall energy costs associated. All components of NS300 are built to last, supported by a comprehensive service plan that ensures maximum operational efficiency and performance. This makes it an ideal choice for semiconductor fabricators seeking a reliable and efficient wafer and mask scrubber asset.