Used THOMAS SWAN Episorb II #9017663 for sale

ID: 9017663
Vintage: 1998
Scrubber (2) Bottles Application: InGaAsP dry 1998 vintage.
THOMAS SWAN Episorb II is a highly efficient wafer and mask scrubber designed to provide the ultimate in clean surfaces prior to wafer and mask processing. Episorb II is designed with a unique abrasive cleaning head that gently removes particles from surfaces with minimal damage. The results are smooth, clean surfaces that are then ready for the application of casting, depositing and etching steps used in modern semiconductor fabrication processes. THOMAS SWAN Episorb II is powered by a dual-speed motor that allows for variable speed operation. This allows the operator to adjust the speed of the scrubbing head to accurately control the cleaning force as specified within a given process. The scrubbing head is expertly designed with double-layer abrasive material that effectively removes particles from sensitive surfaces with minimal damage. The multi-ply abrasive material increases the life of the scrubbing head and ensures optimum performance when the unit is called upon to perform. The abrasive action of Episorb II is also designed to minimize the generation of airborne particles that can be generated during use. This is accomplished by an internal dust collection system that captures a majority of the particles during the scrubbing process. The dust collection system then separates the particles from the scrubbing solution for easy disposal. THOMAS SWAN Episorb II is designed for easy maintenance and cleaning. The cleaning head and drive system are readily accessible for quick removal and reinsertion. This makes cleanup and maintenance simple; requiring only the replacement of the scrubbing head in order to restore optimal performance. Overall, Episorb II is an innovative device that provides the edge to maintain a clean and highly efficient work environment for wafer and mask processing. The user-friendly design allows for easy operation, cleaning and maintenance, while the advanced cleaning and dust collection features ensure the highest quality wafer and mask surfaces performance.
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