Used TOHO TECHNOLOGY ME-11164 #9293021 for sale

TOHO TECHNOLOGY ME-11164 is an innovative wafer and mask scrubber designed to ensure high quality results and efficient removal of contaminants from both wafers and masks. This advanced scrubber is designed with an automated, multi-stage cleaning process which involves the combined use of high pressure spray jets, hydro-spray cleaning, ultrasound, and UV irradiation. The first stage of the cleaning process involves the use of a high pressure spray jets which are used to spray cleaning solution onto the wafers and masks and to simultaneously agitate the surface, loosening any particles that may be present. The second stage utilizes shockwave cleaning technology to ensure the thorough removal of any remaining particles. This technology creates multiple shockwaves which break down any particles adhered to the surface of the wafer and mask. The third stage of the cleaning process involves the use of hydro-spray cleaning. This process involves using a specialized cleaning solution which is heated and sprayed onto the wafers and masks to remove any remaining particles. The fourth stage of the cleaning process utilizes the use of ultrasound to break down any particles which might remain on the surfaces of the wafers and masks. Finally, the fifth and final stage of the cleaning process uses UV irradiation to destroy any remaining particles and to ensure that any possible contaminants are eliminated. In addition to the automated cleaning process, ME-11164 includes various safety features including an auto shut off mechanism and touch-sensitive panels which visually alert user when the cleaning is complete. This advanced scrubber also features an LCD display to provide users with detailed information on the cleaning process and ensure precise control over the settings used for each stage. TOHO TECHNOLOGY ME-11164 is an ideal choice for laboratories or factories that need a highly effective, automated scrubber for wafers and masks. This advanced scrubber offers superior performance and accuracy, making it a reliable option for any wafer or mask cleaning requirements.