Used TOSETZ EX-007SU-DF #293629903 for sale
URL successfully copied!
Tap to zoom
ID: 293629903
Scrubbers
(4) Chambers
NW40 Inlet
Flange exhaust, 6"
TEOS
SWAGELOK Nitrogen inlet, 14"
Capacity: 200 L/min
Make up water
Drain line
Water inlet: 3/4" Pipe
Power supply: 200 VAC, 30 A, 50 Hz, 3-Phase.
TOSETZ EX-007SU-DF is a precision wafer and mask scrubber designed to deliver superior particle removal and contamination control. This machine has been developed to meet the stringent requirements of process-critical applications in semiconductor manufacturing, including 3D sensing, advanced lithography, and sub-micron imaging. EX-007SU-DF utilizes a variety of advanced scrubbing technologies to effectively clean both wafers and masks to the highest level of cleanliness, including dry and wet scrubbing, as well as ultrasonic scrubbing to ensure optimal particle removal. TOSETZ EX-007SU-DF is equipped with an integrated dual-head scrubbing chamber, enabling the utilization of both wet and dry scrubbing technologies. The wafers and photomasks are simultaneously cleaned to remove the most difficult particles and debris, ensuring superior cleanliness and contamination control. Additionally, the chamber is constructed entirely from stainless steel and is water-resistant, making it completely safe for use in wet scrubbing. EX-007SU-DF also features a powerful, high-pressure air circulator which effectively agitates the scrubbing solutions and removes contaminants from the chamber. This helps to improve the effectiveness of the scrubbing process and eliminates the need for cumbersome and manual agitation tasks. Additionally, TOSETZ EX-007SU-DF is outfitted with an intelligent auto-scrubbing system, allowing users to effortlessly program and execute scrubbing tasks with minimal intervention. The scrubbing cycle can also be fine-tuned and adjusted to accommodate delicate materials. EX-007SU-DF is designed to handle a variety of substrates, including 200mm and 300mm wafer carriers, as well as photomasks up to 200mm in size. The flexibility of this scrubber allows for a range of substrates to be handled quickly and accurately. Additionally, the chamber features an ergonomically-designed loading chamber to facilitate product loading. Overall, TOSETZ EX-007SU-DF is an advanced, state-of-the-art wafer and mask scrubber that effectively cleans both wafers and masks to the highest level of cleanliness. Its comprehensive list of scrubbing technologies, coupled with its powerful air circulator, make it ideal for process-critical applications in semiconductor manufacturing. Its versatility, easy-to-use programming, and range of substrate compatibility make it an ideal solution for any scrubbing application.
There are no reviews yet