Used ULTRA-T EQUIPMENT / UTE PSC 122M #9301030 for sale

ULTRA-T EQUIPMENT / UTE PSC 122M Wafer & Mask Scrubber is a versatile piece of equipment designed to provide precision cleaning of wafers and masks in the semiconductor fabrication process. The machine features a high-throughput, automated equipment that is capable of quickly scrubbing a maximum of six 300mm wafers or masks simultaneously in order to achieve superior cleansing results. The scrubbing process takes place in a reclining cabinet which safely and securely holds the wafer or mask in a comfortable, ergonomic-friendly environment. The unit is equipped with an adjustable brush height, vibration frequency, and temperature range that allows fine control over the scrubbing parameters. The built-in air curtain helps to prevent airborne particles from entering the cabinet and allows for a better cleaning environment for the wafers and masks. The scrubbing process is managed by a control system that automates the operations including machine cycles, brush speed, temperature, and touch counts. Additionally, it allows for the programming of different cleaning cycles to meet specific cleaning parameters required for the wafer and mask fabrication processes. The user-friendly interface, built-in memory, and programmable cycle functions make it easy for operators to quickly adjust the machine's settings and parameter settings when needed. The unit also features a built-in monitoring and alarm machine that can be programmed with various parameters and thresholds, including wafer temperature, brush pressure, vibrational frequency, and cycle time. These parameters can be easily adjusted to optimize the scrubbing process and prevent any potential safety issues. UTE PSC 122M Wafer & Mask Scrubber is designed to meet the most demanding semiconductor fabrication requirements, and is an ideal choice for accurate and efficient wafer and mask scrubbing. The sophisticated design, high-throughput tool, and robust features make it an excellent choice for any modern production facility.