Used ULTRATECH 605 #9036579 for sale

Manufacturer
ULTRATECH
Model
605
ID: 9036579
Mask cleaner Brush and high pressure scrubbing Holds up to three 6" wafers.
ULTRATECH 605 is an advanced wafer and mask scrubber designed to provide thorough cleaning of wafers, wafer frames, and photomasks. This innovative device provides superior cleaning performance and automated functions, allowing users to achieve superior results with minimum effort. 605 is engineered using an oscillating, scrubbing brush system that operates on a unique feeding and pressurizing mechanism. The device has variable scrubbing intensity settings, allowing users to customize the cleaning process. In addition, ULTRATECH 605 also features an automated horizontal spin scrubber capable of cleaning nearly 95% of the wafer surface, along with a reach of over 160 inches. 605 is designed with a specialized spray-on cleaning system, providing precise and uniform coverage of all surfaces. The device also has adjustable pressure settings that ensure precise operation and excellent chemical adherence. Furthermore, ULTRATECH 605 supports chemical recycling and recovery for all types of wastewater, helping to minimize waste, reduce hazardous chemical use, and promote sustainability. 605 is powered by a fully-sealed mechanism, preventing any potential cross-contamination. This ensures superior hygiene and cleaning efficiency all while limiting water and chemical usage. The device also has a PLC-controlled programmable operating panel, allowing users to control settings and parameters, such as stroke speed and chemical mixtures. In addition to its advanced cleaning abilities, ULTRATECH 605 is also equipped with a range of customizable and comprehensive safety features. This includes protection against electrical shock, overpressure shutdowns, and automatic shut down in case of an emergency. The device also has an IP 67 housing construction, making it dustproof and waterproof for improved durability. Overall, 605 provides a versatile and reliable solution for detailed cleaning of wafers, wafer frames and photomasks. It offers superior performance, precise operation and excellent safety features, all while saving on time, material, and energy.
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