Used YES 12-2P-CP #9272598 for sale

YES 12-2P-CP is an automated wafer and mask scrubber used to economically improve wafer and mask surface cleanliness. 12-2P-CP combines wet chemical cleaning and automated scrubbing to effectively clean both the wafer and the mask surface in a single operation cycle. YES 12-2P-CP consists of a robotic arm, which is mounted on a sliding gantry, a cleaning tank, a mask and a wafer scrubbing stations, a water-jet scrubbing station, a post-scrubbing rinsing station, an air-drying station, and a chemical recycling system. All components are tightly controlled through Human Machine Interface (HMI) with an easy to use touch screen. The robotic arm of 12-2P-CP is designed to accommodate the individual specifications of many kind of substrates including notched, bumped, and pad patterned wafers. Its flexibility and precision allow it to accurately reach different parts of the wafer for better results. The robotic arm is also fitted with a vision system, which can measure the wafer size and detect any foreign particles on the wafer surface. The cleaning tank of YES 12-2P-CP is equipped with several high-pressure jets that are used to agitate the cleaning solution. The cleaning solution contains the most suitable surfactant, which depends on the material of the wafer and the mask. The cleaning process is automated and monitored, so that the concentrations of the surfactants can be adjusted at any time. The mask and wafer scrubbing stations apply a uniform scrubbing pattern over the entire surface of the wafer, using a high-speed, multi-armed robotic arm. This process removes particles and other contaminants, ensuring that the wafer and mask surfaces are free of smears. The water-jet scrubbing station uses a high-pressure jet of oil-free water to remove debris from the patterned mask. The post-scrubbing rinsing station aids in the removal of residual surfactants from the wafer and mask surface. The air-drying station utilizes a combination of pressurized air and heated dryers, which remove the residual cleaning solution and evaporates any moisture trapped on the wafer. 12-2P-CP is capable of running various operation cycles, such as pre-scrubbing soaking, post-scrubbing rinsing and drying, and chemical recycling. The chemical recycling system in YES 12-2P-CP ensures that the cleaning solution is recycled and reused, making it both cost- and eco-friendly. Overall, 12-2P-CP is an efficient and economical tool for wafer and mask cleaning. It is used in the fabrication of various integrated circuits and microelectronic components, ensuring that both the wafer and mask are clean and free from contaminants.