Used KLA / TENCOR SP1-TBI #9257857 for sale
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ID: 9257857
Wafer Size: 8"-12"
Vintage: 2002
Wafer defect inspection system, 8"-12"
Automation-open cassette
Notch align
Port, 8"/12"
Includes:
Standard handling
Cassette station
Oblique illumination
Puck handling
Robot
Single paddle
No bright field
No backside option
No dual end effector
No SMIF
Laser installed
Operating system: Windows XP
2002 vintage.
KLA / TENCOR SP1-TBI, a mask & wafer inspection equipment, is an automated inspection system designed for the detection of critical defects to yield the highest-quality wafers for production. It is used to inspect patterned or unpatterned device masks, wafers, and reticles for defects, allowing for the evaluation to be conducted with maximum accuracy and efficiency. The unit analyzes images without relying on subjective judgments, while its high-resolution optics, and high-accuracy algorithmic defect detection capabilities are able to detect and classify defects over a variety of mask and wafer types. The optical machine of KLA SP1T-BI utilizes a large field-of-view (FOV) objectives with repeatable imaging that, in combination with proprietary algorithms and optics engineered to reduce flare and uniformity errors, generates reliable and repeatable data for each optical field. The tool also features programmable laser stripe illumination that is optimized for mask imaging that can achieve up to 0.45μm resolution for reticles and 0.28μm resolution for mask inspections. The hardware also comprises a wafer grip-set for automated wafer exchange, infrared imaging capabilities, and a programmable robotic arm that moves from one asset position to another to facilitate wafer and mask loading and unloading. The powerful Vision Analyzer software, which integrates all the hardware components and advanced algorithmic processing of images, is equipped with artificial intelligence (AI)-enabled smart defect detection technology, providing accurate and robust image analysis that advance both surface and sub-surface defect detection. Moreover, TENCOR SP1 TBI is designed for high-throughput applications, with speedy inspection and performing automation. This model inspects hundreds of parts inspection in a short time and accurately delivers results with high resolution color imaging. It allows users to control the parameters of the equipment, such as pixel size, light source, exposure time, defect size, and more, which further ensures the accuracy of the inspection. In addition, the system also features a user-friendly interface for easy operation and parameter control. In conclusion, TENCOR SP 1 TBI is a reliable and powerful unit for mask and wafer inspection. The implementation of its hardware and advanced Vision Analyzer software offers robust defect detection capabilities as well as automated wafer exchange and high-throughput options to yield the highest-quality wafers for production.
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